PART |
Description |
Maker |
567UVG010MFBJ 187UVG016MFBJ |
High temperature ?Very Low ESR ?High ripple current ?stable with temperature ?High frequency
|
Illinois Capacitor, Inc...
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NV2RZDC12V0.64 NV2RZDC12V0.93 NV2R NV2RSDC12V0.93 |
Withstands high temperature, operating under 105 ambient temperature
|
DB Lectro Inc.
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3141 A3143 UGN3120ELT UGN3120EUA UGN3120LLT UGN312 |
SENSITIVE HALL-EFFECT SWITCHES FOR HIGH-TEMPERATURE OPERATION 敏感的霍尔效应开关高温作 IC SENSOR 1 CHAN QTOUCH SOT23-6 (UGN3141 - UGN3144) SENSITIVE HALL-EFFECT SWITCHES FOR HIGH-TEMPERATURE OPERATION Sensitive Hall-Effect Switches, High-Temperature
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Allegro MicroSystems, Inc. ALLEGRO[Allegro MicroSystems] http://
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125293U020AJ1B 125114U005AJ1B 125114U6R3AC1B 12523 |
The Pace-Setter for Long Life and High Temperature Type 125 -55 篓卢C to 125 篓卢C, Ultra-High Temperature, Military Grade Type 125 -55 潞C to 125 潞C, Ultra-High Temperature, Military Grade Type 125 -55 oC to 125 oC, Ultra-High Temperature, Military Grade Type 125 -55 ìC to 125 ìC, Ultra-High Temperature, Military Grade
|
Cornell Dubilier Electr... List of Unclassifed Man... ETC List of Unclassifed Manufacturers http:// Cornell Dubilier Electronics
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SMM4FXXA-TR SMM4F28A SMM4F24A SMM4F20A SMM4F15A SM |
High junction temperature Transil?/a> High junction temperature Transil⑩
|
STMicroelectronics
|
W4NRD0X-0000 W4NRD8C-U000 W4NXD8C-0000 W4NXD8C-L00 |
Diameter: 50.8mm; LCW substrates; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition Diameter: 50.8mm; ultra-low mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition Diameter: 50.8mm; standatd mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition Diameter: 50.8mm; low mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition Diameter: 50.8mm; select mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition Diameter: 76.2mm; LCW type; 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition Diameter: 50.8mm; LCW type; 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition Diameter: 50.8mm; lsemi-insulating (prototype); 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition
|
CREE POWER
|
T2035H-600TRG T2035H-600G-TR T2035H T2035H-600G T2 |
Snubberless?/a> high temperature 20 A Triacs Snubberless high temperature 20 A Triacs Snubberless⑩ high temperature 20 A Triacs
|
STMicroelectronics
|
TZ150N22KOF TZ150N18KOF TZ150N24KOF TZ150N26KOC |
High junction temperature Transil 晶闸管模块|可控硅| 2.2KV五(无线资源管理)| 223A我(翻译 High junction temperature Transil 晶闸管模块|可控硅| 1.8KV五(无线资源管理)| 223A我(翻译 High junction temperature Transil 晶闸管模块|可控硅| 2.4KV五(无线资源管理)| 223A我(翻译 High junction temperature Transil 晶闸管模块|可控硅| 2.6KV五(无线资源管理)| 223A我(翻译
|
Infineon Technologies AG
|
SS2PH9-E3_84A SS2PH9-E3_85A SS2PH9HE3_84A SS2PH9HE |
High-Voltage Surface Mount Schottky Barrier Rectifiers High Barrier Technology for Improved High Temperature Performance
|
Vishay Siliconix
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