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  Datasheet File OCR Text:
 PROCESS
Switching Diode
CPD41
Central
TM
High Current Switching Diode Chip
Semiconductor Corp.
PROCESS DETAILS Process Die Size Die Thickness Anode Bonding Pad Area Top Side Metalization Back Side Metalization EPITAXIAL PLANAR 20 x 20 MILS 8.0 MILS 6.5 x 6.5 MILS Al - 30,000A Au - 12,000A
GEOMETRY GROSS DIE PER 4 INCH WAFER 29,250 PRINCIPAL DEVICE TYPES 1N3600 1N4150 CMPD4150
BACKSIDE CATHODE
145 Adams Avenue Hauppauge, NY 11788 USA Tel: (631) 435-1110 Fax: (631) 435-1824 www.centralsemi.com
R2 (1-August 2002)
Central
1000
TM
PROCESS
CPD41
Semiconductor Corp.
Typical Electrical Characteristics
Forward Voltage
100
Leakage Current
IF, Forward Current (mA)
IR, Reverse Current (A)
100
TA = 125C
10
TA = 125C
10
TA = -40C
1
TA = 75C
1
TA = 25C
0.1
TA = 25C
0.1 0 0.2 0.4 0.6 0.8 1 1.2
0.01 0 10 20 30 40 50
VF, Forward Voltage (V)
VR, Reverse Voltage (V)
Capacitance
0.96 0.94
Forward Dynamic Impedance
ZD, Dynamic Impedance (ohms)
100
0.98
C, Capacitance (pF)
0.92 0.9 0.88 0.86 0.84 0.82 0.8 0.1 1 10 100
TA = 25C
10
1
TA = 25C
0.1 1 10 100 1000
VR, Reverse Voltage (V)
IF, Forward Current (mA)
145 Adams Avenue Hauppauge, NY 11788 USA Tel: (631) 435-1110 Fax: (631) 435-1824 www.centralsemi.com
R2 (1-August 2002)


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